Sputtering of silicon nanopowders by an argon cluster ion beam
نویسندگان
چکیده
منابع مشابه
Morphology change of the silicon surface induced by Ar ion beam sputtering
It is well known that low and medium energy ion sputtering may induce a fabrication of periodic nanoscale structures on an irradiated surface [1]. Depending on the sputtered substrate characteristics and sputtering conditions, different types of nanoscale structures such as ripples, nanoholes and nanodots can grow on a target during ion beam sputtering [2–6]. These patterns have been found on b...
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We report on the production of ordered assemblies of silicon nanostructures by means of irradiation of a Si ~100! substrate with 1.2 keV Ar ions at normal incidence. Atomic force and high-resolution transmission electron microscopies show that the silicon structures are crystalline, display homogeneous height, and spontaneously arrange into short-range hexagonal ordering. Under prolonged irradi...
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We study the self-organized ordering of nanostructures produced by ion-beam sputtering of targets amorphizing under irradiation. By introducing a model akin to models of pattern formation in aeolian sand dunes, we extend consistently the current continuum theory of erosion by IBS. We obtain new nonlinear effects responsible for the in-plane ordering of the structures, whose strength correlates ...
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Low-energy-ion bombardment of semiconductors can lead to the development of complex and diverse nanostructures. Of particular interest in these structured surfaces is the formation of highly ordered patterns whose optical, electronic, andmagnetic properties are different from those of bulk materials and might find technological uses. Compared to the low efficiency of lithographic methods for ma...
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ژورنال
عنوان ژورنال: Beilstein Journal of Nanotechnology
سال: 2019
ISSN: 2190-4286
DOI: 10.3762/bjnano.10.13